Patent Assignment
Reel/Frame 022001/0558
Assignment of Assignor's Interest
Recorded: 2008-12-18
Pages: 5
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, 000, KOREA, REPUBLIC OF
Covered Property
(1)
Method of Forming a Dielectric Layer Pattern and Method of Manufacturing a Non-Volatile Memory Device Using the Same