IP Library Assignment 022226/0115
Patent Assignment
Reel/Frame 022226/0115

Assignment of Assignor's Interest

Recorded: 2009-02-09 Pages: 5
Assignors
LIU, CHUNG-SHI
Executed: 2008-11-13
YU, CHEN-HUA
Executed: 2008-12-23
Assignees
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW (IMEC)
KAPELDREEF 75, LEUVEN, 3001, BELGIUM
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TSMC)
8, LI-HSIN ROAD 6, HSIN-CHU, 300-077, TAIWAN
Covered Property (1)
Integrated Circuit and Manufacturing Method of Copper Germanide and Copper Silicide as Copper Capping Layer
Patent: 7,858,519 →
Application: 12/264,095 →
Publication: US 2009/0134521
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
"Imec" Is an Alternative Official Name for "Interuniversitair Microelektronica Centrum Vzw" Apr 7, 2010
From: INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW
To: IMEC
Reel/Frame 024200/0675 →