Patent Assignment
Reel/Frame 022635/0047
Assignment of Assignor's Interest
Recorded: 2009-05-01
Pages: 4
Assignors
WIAUX, VINCENT JEAN-MARIE PIERRE PAUL
Executed: 2009-03-18
VERHAEGEN, GUSTAAF
Executed: 2009-03-19
Assignee
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW (IMEC)
KAPELDREEF 75, LEUVEN, 3001, BELGIUM
Covered Property
(1)
Method and System for Mask Design for Double Patterning
Application:
12/390,377 →
Publication:
US 2009/0217224
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.