IP Library Assignment 022651/0516
Patent Assignment
Reel/Frame 022651/0516

Assignment of Assignor's Interest

Recorded: 2009-05-07 Pages: 5
Assignors
FURUNO, MAKOTO
Executed: 2009-04-21
SUGIYAMA, TETSUO
Executed: 2009-04-17
NOZAWA, TAICHI
Executed: 2009-04-21
ICHIJO, MITSUHIRO
Executed: 2009-04-21
TAJIMA, RYOTA
Executed: 2009-04-21
YAMAZAKI, SHUNPEI
Executed: 2009-04-21
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Method for Manufacturing Semiconductor Device
Patent: 8,247,315 →
Application: 12/400,844 →
Publication: US 2009/0233425