Assignment of Assignor's Interest

Recorded: 2009-06-12 Pages: 3

Assignors

HAYASHI, KAZUYUKI

Executed: 2009-05-27

KADOWAKI, KAZUO

Executed: 2009-05-27

SUGIYAMA, TAKASHI

Executed: 2009-05-27

Assignee

ASAHI GLASS COMPANY, LIMITED

12-1, YURAKUCHO 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography, and Substrate with Functional Film for the Mask Blank

Patent: 8,003,282 →

Application: 12/483,785 →

Publication: US 2009/0253055

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.