IP Library Assignment 023026/0133
Patent Assignment
Reel/Frame 023026/0133

Assignment of Assignor's Interest

Recorded: 2009-07-30 Pages: 2
Assignor
UESUGI, HIROYUKI
Executed: 2009-06-30
Assignee
FUJITSU MICROELECTRONICS LIMITED
7-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0722, JAPAN
Covered Property (1)
Chemical Vapor Deposition Apparatus, Film Forming Method, and Method of Manufacturing Semiconductor Device
Patent: 8,409,983 →
Application: 12/510,608 →
Publication: US 2009/0286398
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jul 9, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 024651/0744 →
Change of Address Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →