IP Library Assignment 023155/0362
Patent Assignment
Reel/Frame 023155/0362

Assignment of Assignor's Interest

Recorded: 2009-08-21 Pages: 5
Assignors
YEH, GUAN-HUA
Executed: 2009-08-18
CHENG, TSAI-LAI
Executed: 2009-08-18
WU, HONG-GI
Executed: 2009-08-18
Assignee
INNOLUX DISPLAY CORP.
NO. 160 KESYUE RD., CHU-NAN SITE, HSINCHU SCIENCE PARK, CHU-NAN 350, MIAO-LI COUNTY, R.O.C., TAIWAN
Covered Property (1)
Method for Fabricating Low Temperature Poly-Silicon Thin Film Transistor Substrate
Patent: 7,985,636 →
Application: 12/583,461 →
Publication: US 2010/0047975
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name May 25, 2011
From: INNOLUX DISPLAY CORP.
To: CHIMEI INNOLUX CORPORATION
Reel/Frame 026334/0544 →
Change of Name Apr 7, 2014
From: CHIMEI INNOLUX CORPORATION
To: INNOLUX CORPORATION
Reel/Frame 032621/0718 →