IP Library Assignment 023543/0293
Patent Assignment
Reel/Frame 023543/0293

Assignment of Assignor's Interest

Recorded: 2009-11-19 Pages: 2
Assignors
KATO, MASAKAZU
Executed: 2009-11-09
HAMADA, TAKAHIRO
Executed: 2009-11-09
ENOMOTO, TOMOYUKI
Executed: 2009-11-09
Assignee
NISSAN CHEMICAL INDUSTRIES, LTD.
7-1, KANDA-NISHIKI-CHO 3-CHOME, CHIYODA-KU, TOKYO, 1010054, JAPAN
Covered Property (1)
Resist Underlayer Film Forming Composition Containing Low Molecular Weight Dissolution Accelerator
Patent: 9,645,494 →
Application: 12/448,130 →
Publication: US 2010/0075253