Patent Assignment
Reel/Frame 023700/0469
Assignment of Assignor's Interest
Recorded: 2009-12-24
Pages: 6
Assignors
HONG, SUN-YOUNG
Executed: 2009-06-29
SUH, NAM-SEOK
Executed: 2009-06-29
PARK, HONG-SIK
Executed: 2009-06-29
LEE, SANG-DAI
Executed: 2009-06-29
PARK, YOUNG-JIN
Executed: 2009-06-29
CHOUNG, JONG-HYUN
Executed: 2009-06-29
KIM, BONG-KYUN
Executed: 2009-06-29
LEE, BYEONG-JIN
Executed: 2009-06-29
Assignees
SAMSUNG ELECTRONICS CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU, GYEONGGI-DO, SUWON-SI, 443-803, KOREA, REPUBLIC OF
ENF TECHNOLOGY CO., LTD.
4F, SUSAN BUILDING, #205-5, NONHYEON-DONG, GANGNAM-GU, SEOUL, KOREA, REPUBLIC OF
Covered Property
(1)
Composition for Removing a Photoresist Pattern and Method of Forming a Metal Pattern Using the Composition
Application:
12/629,597 →
Publication:
US 2010/0159400
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.