IP Library Assignment 023779/0592
Patent Assignment
Reel/Frame 023779/0592

Assignment of Assignor's Interest

Recorded: 2010-01-13 Pages: 4
Assignors
VALDIVIA, JUAN
Executed: 2010-01-07
GANGADHARAN, SHIBU
Executed: 2010-01-06
MARCH, DAVE
Executed: 2010-01-04
POTTER, CHARLES
Executed: 2010-01-04
Assignee
LAM RESEARCH CORPORATION
4650 CUSHING PARKWAY, FREMONT, CALIFORNIA, 94538
Covered Property (1)
Aspect Ratio Adjustment of Mask Pattern Using Trimming to Alter Geometry of Photoresist Features
Patent: 8,394,723 →
Application: 12/684,032 →
Publication: US 2011/0163420