Patent Assignment
Reel/Frame 023886/0176
Assignment of Assignor's Interest
Recorded: 2010-02-02
Pages: 3
Assignee
RENESAS TECHNOLOGY CORP.
6-2, OTEMACHI 2-CHOME, CHIYODA-KU,, TOKYO, JAPAN
Covered Property
(1)
A Method for Manufacturing a Semiconductor Device Having a Silicide Region Comprised of a Silicide of a Nickel Alloy
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.