IP Library Assignment 023893/0685
Patent Assignment
Reel/Frame 023893/0685

Assignment of Assignor's Interest

Recorded: 2010-02-03 Pages: 2
Assignors
NAGASE, NORIMASA
Executed: 2009-12-28
SUZUKI, KOICHI
Executed: 2009-12-28
MINEMURA, MASAHIKO
Executed: 2009-12-28
Assignee
FUJITSU MICROELECTRONICS LIMITED
2-10-23 SHIN-YOKOHAMA, KOHOKU-KU,, YOKOHAMA-SHI, KANAGAWA, 222-0033, JAPAN
Covered Property (1)
Method of Performing Optical Proximity Effect Corrections to Photomask Pattern
Patent: 8,365,105 →
Application: 12/698,498 →
Publication: US 2010/0138019
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jul 9, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 024651/0744 →
Change of Address Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →