IP Library Assignment 024062/0515
Patent Assignment
Reel/Frame 024062/0515

Assignment of Assignor's Interest

Recorded: 2010-03-11 Pages: 2
Assignors
HATAKEYAMA, JUN
Executed: 2010-03-01
HASEGAWA, KOJI
Executed: 2010-03-01
TACHIBANA, SEIICHIRO
Executed: 2010-03-01
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Positive Resist Composition and Patterning Process
Patent: 8,450,042 →
Application: 12/720,098 →
Publication: US 2010/0227274