Assignment of Assignor's Interest

Recorded: 2010-08-13 Pages: 3

Assignors

HAYASHI, KAZUYUKI

Executed: 2010-05-24

UNO, TOSHIYUKI

Executed: 2010-05-24

EBIHARA, KEN

Executed: 2010-05-25

Assignee

ASAHI GLASS COMPANY, LIMITED

12-1, YURAKUCHO 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography

Patent: 8,029,950 →

Application: 12/855,053 →

Publication: US 2010/0304283

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.