IP Library Assignment 025410/0673
Patent Assignment
Reel/Frame 025410/0673

Assignment of Assignor's Interest

Recorded: 2010-11-19 Pages: 9
Assignors
HSIAO, HSIANG-CHIH
Executed: 2010-10-05
LIAO, TA-WEN
Executed: 2010-11-05
YANG, CHI-MIN
Executed: 2010-11-03
CHEN, SHAN-FANG
Executed: 2010-11-03
CHANG, YA-PING
Executed: 2010-09-23
YANG, CHI-HUNG
Executed: 2010-09-07
LIAO, CHUNG-YUAN
Executed: 2010-09-07
Assignee
AU OPTRONICS CORPORATION
NO. 1, LI-HSIN RD. II, SCIENCE-BASED INDUSTRIAL PARK,, HSINCHU, TAIWAN
Covered Property (1)
Exposure Apparatus, Method of Forming Patterned Layer, Method of Forming Patterned Photoresist Layer, Active Device Array Substrate and Patterned Layer
Patent: 8,427,631 →
Application: 12/947,825 →
Publication: US 2011/0223393
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 20, 2024
From: AU OPTRONICS CORPORATION
To: AUO CORPORATION
Reel/Frame 067797/0978 →
Assignment of Assignor's Interest Jul 15, 2024
From: AUO CORPORATION
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 068323/0055 →