Assignment of Assignor's Interest

Recorded: 2011-02-28 Pages: 3

Assignor

KAGEYAMA, JUNICHI

Executed: 2011-01-13

Assignee

ASAHI GLASS COMPANY, LIMITED

12-1, YURAKUCHO 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Process for Producing Reflective Mask Blank for Euv Lithography and Process for Producing Substrate with Functional Film for the Mask Blank

Patent: 8,562,794 →

Application: 12/967,724 →

Publication: US 2012/0145534

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.