Assignment of Assignor's Interest

Recorded: 2011-03-02 Pages: 3

Assignor

IKUTA, YOSHIAKI

Executed: 2010-12-24

Assignee

ASAHI GLASS COMPANY, LIMITED

12-1, YURAKUCHO 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography, Process for Producing the Same and Mask for Euv Lithography

Patent: 8,241,821 →

Application: 13/038,429 →

Publication: US 2011/0165504

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.