IP Library Assignment 025904/0666
Patent Assignment
Reel/Frame 025904/0666

Assignment of Assignor's Interest

Recorded: 2011-03-04 Pages: 4
Assignors
FUJIMURA, AKIRA
Executed: 2011-02-28
HAGIWARA, KAZUYUKI
Executed: 2011-03-01
MEIER, STEPHEN F.
Executed: 2011-03-02
BORK, INGO
Executed: 2011-03-02
Assignee
D2S, INC.
4040 MOORPARK AVENUE, #250, SAN JOSE, CALIFORNIA, 95117
Covered Property (1)
Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography
Patent: 9,057,956 →
Application: 13/037,270 →
Publication: US 2012/0221981