Patent Assignment
Reel/Frame 026581/0754
Assignment of Assignor's Interest
Recorded: 2011-07-13
Pages: 2
Assignor
NISHIO, RYOJI
Executed: 2011-07-08
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHIMBASHI, MINATO-KU,, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Equipment and Plasma Generation Equipment
Application:
13/144,299 →
Publication:
US 2011/0284167