IP Library Assignment 027363/0398
Patent Assignment
Reel/Frame 027363/0398

Assignment of Assignor's Interest

Recorded: 2011-12-12 Pages: 2
Assignor
IBA, YOSHIHISA
Executed: 2011-09-18
Assignee
FUJITSU SEMICONDUCTOR LIMITED
2-10-23 SHIN-YOKOHAMA, KOHOKU-KU, YOKOHAMA-SHI, KANAGAWA, 222-0033, JAPAN
Covered Property (1)
Method of Manufacturing Magnetoresistive Effect Element That Includes Forming Insulative Sidewall Metal Oxide Layer by Sputtering Particles of Metal Material from Patterned Metal Layer
Patent: 8,828,742 →
Application: 13/290,779 →
Publication: US 2012/0139019
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →
Assignment of Assignor's Interest Jul 14, 2020
From: FUJITSU SEMICONDUCTOR LIMITED
To: AIZU FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 053209/0468 →
Change of Name and Change of Address Jul 16, 2020
From: AIZU FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 053481/0962 →