Patent Assignment
Reel/Frame 027760/0421
Assignment of Assignor's Interest
Recorded: 2012-02-24
Pages: 4
Assignee
MITSUBISHI GAS CHEMICAL COMPANY, INC.
MITSUBISHI BUILDING 5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8324, JAPAN
Covered Property
(1)
Cyclic Compound, Process for Production of the Cyclic Compound, Radiation-Sensitive Composition, and Method for Formation of Resist Pattern