Patent Assignment
Reel/Frame 028257/0934
Assignment of Assignor's Interest
Recorded: 2012-05-23
Pages: 3
Assignors
MIKAMI, MASAKI
Executed: 2012-02-29
KOMAKINE, MITSUHIKO
Executed: 2012-03-02
IKUTA, YOSHIAKI
Executed: 2012-03-01
Assignee
ASAHI GLASS COMPANY, LIMITED
5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN
Covered Property
(1)
Reflective Layer-Equipped Substrate for Euv Lithography, Reflective Mask Blank for Euv Lithography, Reflective Mask for Euv Lithography, and Process for Production of the Reflective Layer-Equipped Substrate
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.