IP Library Assignment 029329/0479
Patent Assignment
Reel/Frame 029329/0479

Assignment of Assignor's Interest

Recorded: 2012-11-20 Pages: 4
Assignors
LEE, KI LYOUNG
Executed: 2012-11-09
BOK, CHEOL KYU
Executed: 2012-11-09
KIM, WON KYU
Executed: 2012-11-09
Assignee
SK HYNIX INC.
2091, GYEONGCHUNG-DAERO, BUBAL-EUB, ICHEON, GYEONGGI-DO, ICHEON, 467-734, KOREA, REPUBLIC OF
Covered Property (1)
Method for Forming Fine Pattern of Semiconductor Device Using Double Spacer Patterning Technology
Patent: 8,999,848 →
Application: 13/679,518 →
Publication: US 2014/0017889