Assignment of Assignor's Interest

Recorded: 2013-01-11 Pages: 2

Assignor

HAYASHI, KAZUYUKI

Executed: 2012-12-18

Assignee

ASAHI GLASS COMPANY, LIMITED

5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography and Reflective Mask for Euv Lithography

Patent: 8,828,627 →

Application: 13/739,373 →

Publication: US 2013/0196255

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.