Patent Assignment
Reel/Frame 029645/0445
Assignment of Assignor's Interest
Recorded: 2013-01-17
Pages: 2
Assignors
MORIMOTO, MICHIKAZU
Executed: 2012-12-13
OHGOSHI, YASUO
Executed: 2012-12-13
OOHIRABARU, YUUZOU
Executed: 2012-12-13
ONO, TETSUO
Executed: 2012-12-14
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME,, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Plasma Processing Method
Application:
13/743,367 →
Publication:
US 2014/0057445