Patent Assignment
Reel/Frame 030110/0510
Change of Name
Recorded: 2013-03-28
Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2013-03-28
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Photosensitive Resin Composition, Photosensitive Element, Resist Pattern Manufacturing Method, and Printed Circuit Board Manufacturing Method
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.