Assignment of Assignor's Interest

Recorded: 2013-05-10 Received: 2013-05-10 Pages: 5

Assignor

PLANAR SYSTEMS, INC.

Executed: 2012-12-11

Assignee

BENEQ OY

ENSIMMAINEN SAVU 2, FI-01510 VANTAA, FIX, FINLAND

Covered Properties (11)

Diaphragm Valve for Atomic Layer Deposition

Application: 11/278,482 →

Precursor Material Delivery System for Atomic Layer Deposition

Application: 10/660,365 →

Diaphragm Valve with Reliability Enhancements for Atomic Layer Deposition

Application: 10/609,339 →

High-Speed Diaphragm Valve for Atomic Layer Deposition

Application: 10/609,134 →

Diaphragm Valve for High-Temperature Precursor Supply in Atomic Layer Deposition

Application: 10/609,136 →

Conformal Coatings for Micro-Optical Elements, and Method for Making the Same

Application: 10/404,928 →

High Conductivity Particle Filter

Application: 10/400,054 →

Display

Application: 09/834,386 →

Amel Device with Improved Optical Properties

Application: 09/804,611 →

Amel Device with Improved Optical Properties

Application: 09/779,991 →

Organic Light Emitting Device

Application: 09/773,397 →