Patent Assignment
Reel/Frame 031547/0814
Assignment of Assignor's Interest
Recorded: 2013-11-05
Pages: 2
Assignors
MIYA, GO
Executed: 2013-07-23
IZAWA, MASARU
Executed: 2013-08-06
TANDOU, TAKUMI
Executed: 2013-07-29
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Plasma Processing Method
Application:
13/928,645 →
Publication:
US 2014/0004706