Patent Assignment
Reel/Frame 031713/0781
Assignment of Assignor's Interest
Recorded: 2013-12-04
Pages: 3
Assignee
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
NO. 195, SEC. 4, CHUNG HSING RD., CHUTUNG, HSINCHU, 31040, TAIWAN
Covered Property
(1)
Reaction Device with Peripheral-in and Center-Out Design for Chemical Vapor Deposition