Assignment of Assignor's Interest

Recorded: 2014-02-18 Pages: 2

Assignor

KINOSHITA, TAKERU

Executed: 2014-01-15

Assignee

ASAHI GLASS COMPANY, LIMITED

5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography, and Reflective Layer-Coated Substrate for Euv Lithography

Patent: 9,261,773 →

Application: 14/182,688 →

Publication: US 2014/0234756

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.