IP Library Assignment 032519/0696
Patent Assignment
Reel/Frame 032519/0696

Assignment of Assignor's Interest

Recorded: 2014-03-25 Pages: 3
Assignors
BOUTON, GUILHEM
Executed: 2013-11-25
REGNIER, PATRICK
Executed: 2013-12-04
Assignee
STMICROELECTRONICS (ROUSSET) SAS
ZI DE PEYNIER ROUSSET, AVENUE COQ., ROUSSET, 13790, FRANCE
Covered Property (1)
Method for Making a Photolithography Mask Intended for the Formation of Contacts, Mask and Integrated Circuit Corresponding Thereto
Application: 14/221,401 →
Publication: US 2014/0291858
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 10, 2023
From: STMICROELECTRONICS (ROUSSET) SAS
To: STMICROELECTRONICS INTERNATIONAL N.V.
Reel/Frame 063282/0118 →