Patent Assignment
Reel/Frame 033042/0577
Assignment of Assignor's Interest
Recorded: 2014-06-05
Pages: 3
Assignee
INNOLUX CORPORATION
NO. 160, KESYUE RD., JHU-NAN SITE, HSINCHU SCIENCE PARK, JHU-NAN, MIAO-LI COUNTY, TAIWAN
Covered Property
(1)
Double-Active-Layer Structure with a Polysilicon Layer and a Microcrystalline Silicon Layer, Method for Manufacturing the Same and Its Application
Application:
14/297,366 →
Publication:
US 2014/0287571