Assignment of Assignor's Interest

Recorded: 2014-07-03 Pages: 4

Assignors

RADI, BABAK

Executed: 2014-05-20

CHEN, SHIH-HONG

Executed: 2014-05-20

KUO, YU-FU

Executed: 2014-05-20

CHUANG, TZU-WEN

Executed: 2014-05-20

Assignee

WISTRON NEWEB CORP.

20 PARK AVENUE II , HSINCHU SCIENCE PARK,, HSINCHU, 308, TAIWAN

Covered Property (1)

Method of Forming Metallic Pattern on Polymer Substrate

Patent: 9,657,404 →

Application: 14/316,809 →

Publication: US 2015/0376809

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.