Assignment of Assignor's Interest

Recorded: 2014-08-21 Pages: 2

Assignor

MIKAMI, MASAKI

Executed: 2014-07-25

Assignee

ASAHI GLASS COMPANY, LIMITED

5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography, or Reflective Layer-Coated Substrate for Euv Lithography, and Process for Its Production

Patent: 9,448,469 →

Application: 14/465,280 →

Publication: US 2015/0160548

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.