IP Library Assignment 034654/0586
Patent Assignment
Reel/Frame 034654/0586

Assignment of Assignor's Interest

Recorded: 2015-01-07 Pages: 5
Assignors
LEE, SHING LONG
Executed: 2013-09-13
WANG, YI-CHIEH
Executed: 2013-09-13
LIN, CHUNG-HAN
Executed: 2013-09-17
PENG, KUANG-JUNG
Executed: 2014-07-11
CHANG, YUN
Executed: 2013-09-16
KUO, SHOU-WEN
Executed: 2013-09-13
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
Method and Structure for Nitrogen-Doped Shallow-Trench Isolation Dielectric
Patent: 9,460,957 →
Application: 14/021,608 →
Publication: US 2014/0264720