Assignment of Assignor's Interest

Recorded: 2015-03-27 Pages: 2

Assignor

IKUTA, YOSHIAKI

Executed: 2015-03-03

Assignee

ASAHI GLASS COMPANY, LIMITED

5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN

Covered Property (1)

Reflective Mask Blank for Euv Lithography, Method of Manufacturing Thereof, Reflective Mask for Euv Lithography and Method of Manufacturing Thereof

Patent: 9,268,207 →

Application: 14/669,996 →

Publication: US 2015/0198874

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.