IP Library Assignment 035702/0529
Patent Assignment
Reel/Frame 035702/0529

Assignment of Assignor's Interest

Recorded: 2015-05-22 Pages: 3
Assignors
NEMANI, SRINIVAS D.
Executed: 2014-12-16
YIEH, ELLIE Y.
Executed: 2014-12-16
GODET, LUDOVIC
Executed: 2014-12-16
FAN, YIN
Executed: 2014-12-16
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property (1)
Selective Atomic Layer Deposition Process Utilizing Patterned Self Assembled Monolayers for 3D Structure Semiconductor Applications
Patent: 9,515,166 →
Application: 14/276,780 →
Publication: US 2015/0294863