IP Library Assignment 035769/0072
Patent Assignment
Reel/Frame 035769/0072

Assignment of Assignor's Interest

Recorded: 2015-06-02 Pages: 3
Assignors
KONG, BYUNGKOOK
Executed: 2015-04-13
LEE, GENE
Executed: 2015-04-10
YANG, LIMING
Executed: 2015-04-13
Assignee
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE, SANTA CLARA, CALIFORNIA, 95054
Covered Property (1)
High Aspect Ratio Plasma Etch for 3D Nand Semiconductor Applications
Patent: 9,299,580 →
Application: 14/462,817 →
Publication: US 2016/0056050