IP Library Assignment 037769/0038
Patent Assignment
Reel/Frame 037769/0038

Assignment of Assignor's Interest

Recorded: 2016-02-18 Pages: 4
Assignors
YASUDA, ATSUSHI
Executed: 2016-01-18
CHUJO, MIHO
Executed: 2016-01-18
Assignee
MITSUBISHI RAYON CO., LTD.
1-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8253, JAPAN
Covered Property (1)
Copolymer for Semiconductor Lithography, Resist Composition, and Method for Manufacturing Substrate
Application: 14/912,798 →
Publication: US 2016/0200849
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Corporate Name Change Jun 19, 2017
From: MITSUBISHI RAYON CO., LTD.
To: MITSUBISHI CHEMICAL CORPORATION
Reel/Frame 042886/0294 →