IP Library Assignment 038334/0210
Patent Assignment
Reel/Frame 038334/0210

Assignment of Assignor's Interest

Recorded: 2016-04-20 Pages: 8
Assignors
LEE, KWANG KUK
Executed: 2016-03-30
HAM, JIN SU
Executed: 2016-03-30
KIM, SUN JOO
Executed: 2016-03-30
LEE, HYE RYOUNG
Executed: 2016-03-30
JUNG, MIN HO
Executed: 2016-03-30
Assignees
SK INNOVATION CO., LTD.
26, JONG-RO, JONGNO-GU, SEOUL, 03188, KOREA, REPUBLIC OF
SK GLOBAL CHEMICAL CO., LTD.
26, JONG-RO, JONGNO-GU, SEOUL, 03188, KOREA, REPUBLIC OF
Covered Property (1)
Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Forming Resist Underlayer Film Using the Composition
Patent: 9,695,279 →
Application: 15/133,808 →
Publication: US 2016/0311975
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 2, 2022
From: SK GLOBAL CHEMICAL CO., LTD
To: SK GEO CENTRIC CO., LTD.
Reel/Frame 061371/0332 →