IP Library Assignment 039464/0486
Patent Assignment
Reel/Frame 039464/0486

Assignment of Assignor's Interest

Recorded: 2016-08-17 Pages: 4
Assignors
YAMAZAKI, SHUNPEI
Executed: 2012-05-15
MARUYAMA, TETSUNORI
Executed: 2012-05-17
IMOTO, YUKI
Executed: 2012-05-17
SATO, HITOMI
Executed: 2012-05-17
WATANABE, MASAHIRO
Executed: 2012-05-14
MASHIYAMA, MITSUO
Executed: 2012-05-14
OKAZAKI, KENICHI
Executed: 2012-05-14
NAKASHIMA, MOTOKI
Executed: 2012-05-22
SHIMAZU, TAKASHI
Executed: 2012-05-22
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property (1)
Sputtering Target, Method For Manufacturing Sputtering Target, And Method For Forming Thin Film
Application: 15/189,104 →
Publication: US 2017/0016108