Assignment of Assignor's Interest

Recorded: 2018-03-07 Pages: 7

Assignor

BRION TECHNOLOGIES, INC.

Executed: 2010-04-16

Assignee

ASML NETHERLANDS B.V.

DE RUN 6501, VELDHOVEN, NL-5504 DR, NETHERLANDS

Covered Properties (3)

Three-Dimensional Mask Model for Photolithography Simulation

Patent: 8,589,829 →

Application: 13/736,929 →

Publication: US 2013/0139118

Three-Dimensional Mask Model for Photolithography Simulation

Patent: 8,938,694 →

Application: 14/081,386 →

Publication: US 2014/0195993

Three-Dimensional Mask Model for Photolithography Simulation

Patent: 9,372,957 →

Application: 14/600,337 →

Publication: US 2015/0135146

Related Assignments (1)

Other recorded transfers of the patents in this record — the chain of ownership.