Patent Assignment
Reel/Frame 046634/0380
Assignment of Assignor's Interest
Recorded: 2018-07-26
Pages: 4
Assignors
IMAMURA, HISAYUKI
Executed: 2018-06-29
FUJITA, SUGURU
Executed: 2018-07-03
KAGA, YOUICHIROU
Executed: 2018-06-29
TESHIMA, HIROYUKI
Executed: 2018-07-03
HAMAYOSHI, SHIGEYUKI
Executed: 2018-06-29
Assignee
HITACHI METALS, LTD.
2-70, KONAN 1-CHOME, MINATO-KU, TOKYO, 108-8224, JAPAN
Covered Property
(1)
Silicon Nitride Sintered Substrate, Silicon Nitride Sintered Substrate Sheet, Circuit Substrate, and Production Method for Silicon Nitride Sintered Substrate
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.