IP Library › Assignment 051391/0449
Patent Assignment
Reel/Frame 051391/0449

Assignment of Assignor's Interest

Recorded: 2019-12-31 Pages: 19
Assignors
POELZL, MARTIN
Executed: 2018-11-28
ROESCH, MAXIMILIAN
Executed: 2019-12-20
LEOMANT, SYLVAIN
Executed: 2018-11-28
MEISER, ANDREAS
Executed: 2018-09-26
GOLLER, BERNHARD
Executed: 2018-09-03
JOSHI, RAVI KESHAV
Executed: 2018-08-16
Assignee
INFINEON TECHNOLOGIES AUSTRIA AG
SIEMENSSTRASSE 2, VILLACH, 9500, AUSTRIA
Covered Property (1)
Oxygen Inserted Si-Layers for Reduced Substrate Dopant Outdiffusion in Power Devices
Application: 16/058,593 →
Publication: US 2020/0052066
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 31, 2019
From: HAASE, ROBERT
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 051391/0412 →
Assignment of Assignor's Interest Feb 6, 2020
From: INFINEON TECHNOLOGIES AMERICAS CORP.
To: INFINEON TECHNOLOGIES AUSTRIA AG
Reel/Frame 051735/0950 →