Patent Assignment
Reel/Frame 051766/0561
Assignment of Assignor's Interest
Recorded: 2020-02-10
Pages: 11
Assignors
JUNG, MINHO
Executed: 2020-01-22
LEE, NAMKYU
Executed: 2020-01-16
HAM, JINSU
Executed: 2020-01-17
LEE, KYUNPHYO
Executed: 2020-01-16
LEE, KWANGKUK
Executed: 2020-01-16
LEE, KWANGHO
Executed: 2020-01-21
LEE, HYERYOUNG
Executed: 2020-01-20
HWANG, SOOYOUNG
Executed: 2020-01-20
Assignees
SK INNOVATION CO., LTD.
26, JONG-RO, JONGNO-GU, SEOUL, 03188, KOREA, REPUBLIC OF
SK GLOBAL CHEMICAL CO., LTD.
26, JONG-RO, JONGNO-GU, SEOUL, 03188, KOREA, REPUBLIC OF
Covered Property
(1)
Polymer For Formation of Resist Underlayer Film, Composition for Formation of Resist Underlayer Film Comprising Same and Method for Manufacturing Semiconductor Element by Using Same
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.