IP Library Assignment 051790/0380
Patent Assignment
Reel/Frame 051790/0380

Assignment of Assignor's Interest

Recorded: 2020-02-12 Pages: 4
Assignors
WU, MING-FA
Executed: 2020-01-21
HO, WEN-LUNG
Executed: 2020-01-22
CHEN, JHENG-LONG
Executed: 2020-01-22
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO.8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK,, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Deposition Apparatus and Method of Forming Metal Oxide Layer Using the Same
Application: 16/787,043 →
Publication: US 2021/0032750