Assignment of Assignor's Interest

Recorded: 2020-05-12 Pages: 8

Assignors

LEE, SOYOUNG

Executed: 2020-04-13

NIHEI, HIROSHI

Executed: 2020-03-06

SHIRAI, MASASHI

Executed: 2020-03-06

LIM, JAESOON

Executed: 2020-03-09

CHO, YOUNJOUNG

Executed: 2020-03-09

Assignee

SAMSUNG ELECTRONICS CO., LTD.

129, SAMSUNG-RO, YEONGTONG-GU,, SUWON-SI, GYEONGGI-DO, 16677, KOREA, REPUBLIC OF

Covered Property (1)

Method of Selectively Forming Cobalt Metal Layer by Using Cobalt Compound, and Method of Fabricating Semiconductor Device by Using Cobalt Compound

Application: 16/872,504 →

Publication: US 2021/0032279