IP Library Assignment 052881/0134
Patent Assignment
Reel/Frame 052881/0134

Assignment of Assignor's Interest

Recorded: 2020-06-09 Pages: 19
Assignors
POELZL, MARTIN
Executed: 2018-11-28
ROESCH, MAXIMILIAN
Executed: 2019-12-20
LEOMANT, SYLVAIN
Executed: 2018-11-28
MEISER, ANDREAS
Executed: 2018-09-26
GOLLER, BERNHARD
Executed: 2018-09-03
JOSHI, RAVI KESHAV
Executed: 2018-08-16
Assignee
INFINEON TECHNOLOGIES AUSTRIA AG
SIEMENSSTRASSE 2, VILLACH, 9500, AUSTRIA
Covered Property (1)
Method of Forming Oxygen Inserted Si-Layers in Power Semiconductor Devices
Application: 16/896,593 →
Publication: US 2020/0303498
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jun 9, 2020
From: HAASE, ROBERT
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 052880/0712 →
Assignment of Assignor's Interest Jun 8, 2021
From: IINFINEON TECHNOLOGIES AMERICAS CORP
To: INFINEON TECHNOLOGIES AUSTRIA AG; INFINEON TECHNOLOGIES AUSTRIA AG
Reel/Frame 056466/0352 →