Patent Assignment
Reel/Frame 054746/0089
Assignment of Assignor's Interest
Recorded: 2020-12-24
Pages: 7
Assignors
KAWATO, SHUNJI
Executed: 2020-10-06
YANAGITA, HIROSHI
Executed: 2020-09-18
HAMA, YUSUKE
Executed: 2020-09-25
SAO, TAKAYUKI
Executed: 2020-09-25
HIRAYAMA, TAKU
Executed: 2020-10-16
Assignee
MERCK PATENT GMBH
FRANKFURTER STRASSE 250, DARMSTADT, 64293, GERMANY
Covered Property
(1)
A Photoresist Composition, a Method for Manufacturing a Photoresist Coating, Etched Photoresist Coating, and Etched Si Containing Layer(S), and Manufacturing a Device Using Thereof
Application:
17/255,286 →
Publication:
US 2021/0263414