IP Library Assignment 055946/0172
Patent Assignment
Reel/Frame 055946/0172

Assignment of Assignor's Interest

Recorded: 2021-04-16 Pages: 3
Assignors
HUANG, HUI-LIN
Executed: 2021-04-12
SU, LI-LI
Executed: 2021-04-15
YEO, YEE-CHIA
Executed: 2021-04-12
LI, CHII-HORNG
Executed: 2021-04-12
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Epitaxial Source/Drain Recess Formation with Metal-Comprising Masking Layers and Structures Resulting Therefrom
Application: 17/232,898 →
Publication: US 2022/0246479